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Results: 5
Number of items: 5
  • Evrard, Q., Sadegh, N., Mathew, S., Zuidinga, E., Watts, B., Paradiz Dominguez, M., Giglia, A., Mahne, N., Nannarone, S., Nishimura, A., Goya, T., Sugioka, T., Vockenhuber, M., Ekinci, Y., & Brouwer, A. M. (2024). CCDC 2332946: Experimental Crystal Structure Determination [Data set]. Cambridge Crystallographic Data Centre. https://doi.org/10.5517/ccdc.csd.cc2j9mbt
  • Open Access
    Evrard, Q., Sadegh, N., Mathew, S., Zuidinga, E., Watts, B., Paradiz Dominguez, M., Giglia, A., Mahne, N., Nannarone, S., Nishimura, A., Goya, T., Sugioka, T., Vockenhuber, M., Ekinci, Y., & Brouwer, A. M. (2024). Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions. ACS Applied Materials and Interfaces, 16(32), 42947–42956. https://doi.org/10.1021/acsami.4c08636
  • Open Access
    Sadegh, N., Evrard, Q., Kraus, P. M., & Brouwer, A. M. (2024). XUV Absorption Spectroscopy and Photoconversion of a Tin-Oxo Cage Photoresist. Journal of Physical Chemistry C, 128(9), 3965-3974. https://doi.org/10.1021/acs.jpcc.3c07480
  • Open Access
    Sadegh, N., Evrard, Q., Mahne, N., Giglia, A., Nannarone, S., & Brouwer, A. M. (2023). Electron Generation in Tin-oxo Cage Extreme Ultraviolet Photoresists. Journal of Photopolymer Science and Technology, 36(5), 373-378. https://doi.org/10.2494/photopolymer.36.373
  • Open Access
    Evrard, Q., Sadegh, N., Hsu, C. C., Mahne, N., Giglia, A., Nannarone, S., Ekinci, Y., Vockenhuber, M., Nishimura, A., Goya, T., Sugioka, T., & Brouwer, A. M. (2023). Influence of the anion in tin-based EUV photoresists properties. In D. Guerrero, & G. R. Amblard (Eds.), Advances in Patterning Materials and Processes XL: 27 February-1 March 2023, San Jose, California, United States Article 124980Z (Proceedings of SPIE; Vol. 12498). SPIE. https://doi.org/10.1117/12.2658498
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