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Results: 9
Number of items: 9
  • Open Access
    van der Geest, M. L. S., Sadegh, N., Meerwijk, T. M., Wooning, E. I., Wu, L., Bloem, R., Castellanos Ortega, S., Brouwer, A. M., & Kraus, P. M. (2021). Extreme ultraviolet-excited time-resolved luminescence spectroscopy using an ultrafast table-top high-harmonic generation source. Review of Scientific Instruments, 92(11), Article 113004. https://doi.org/10.1063/5.0064780
  • Open Access
    Haitjema, J., Wu, L., Giuliani, A., Nahon, L., Castellanos, S., & Brouwer, A. M. (2021). UV and VUV-induced fragmentation of tin-oxo cage ions. Physical Chemistry Chemical Physics, 23(37), 20909-20918. https://doi.org/10.1039/d1cp03148a
  • Open Access
    Wu, L., Hilbers, M. F., Lugier, O., Thakur, N., Vockenhuber, M., Ekinci, Y., Brouwer, A. M., & Castellanos, S. (2021). Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography. ACS Applied Materials and Interfaces, 13(43), 51790-51798. https://doi.org/10.1021/acsami.1c16257
  • Open Access
    Wu, L., Bespalov, I., Witte, K., Lugier, O., Haitjema, J., Vockenhuber, M., Ekinci, Y., Watts, B., Brouwer, A. M., & Castellanos, S. (2020). Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy. Journal of Materials Chemistry C, 8(42), 14757-14765. https://doi.org/10.1039/d0tc03216f
  • Open Access
    Wu, L. (2020). Metal oxo clusters: Molecular design for extreme ultraviolet lithography. [Thesis, externally prepared, Universiteit van Amsterdam].
  • Wu, L., Tiekink, M., Giuliani, A., Nahon, L., & Castellanos, S. (2019). Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications. Journal of Materials Chemistry C, 7(1), 33-37. https://doi.org/10.1039/C8TC05273E
  • Open Access
    Haitjema, J., Wu, L., Giuliani, A., Nahon, L., Castellanos, S., & Brouwer, A. M. (2018). Photo-induced Fragmentation of a Tin-oxo Cage Compound. Journal of Photopolymer Science and Technology, 31(2), 243-247. https://doi.org/10.2494/photopolymer.31.243
  • Open Access
    Fallica, R., Haitjema, J., Wu, L., Castellanos Ortega, S., Brouwer, A. M., & Ekinci, Y. (2018). Absorption coefficient of metal-containing photoresists in the extreme ultraviolet. Journal of Micro/Nanolithography, MEMS and MOEMS, 17(2), Article 023505. https://doi.org/10.1117/1.JMM.17.2.023505
  • Open Access
    Fallica, R., Haitjema, J., Wu, L., Castellanos Ortega, S., Brouwer, F., & Ekinci, Y. (2017). Absorption coefficient and exposure kinetics of photoresists at EUV. In E. M. Panning, & K. A. Goldberg (Eds.), Extreme Ultraviolet (EUV) Lithography VIII: 27 February–2 March 2017, San Jose, California, United States Article 101430A (Proceedings of SPIE; Vol. 10143). SPIE. https://doi.org/10.1117/12.2257240
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