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Results: 198
Number of items: 198
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Krzhizhanovskaya, V. V., Zatevakhin, M. A., Ignatiev, A. A., Gorbachev, Y. E., Goedheer, W. J., & Sloot, P. M. A. (2004). A 3D Virtual Reactor for Simulation of Silicon-Based Film Production. In Proceedings of the 5th International Bi-Annual ASME/JSME Symposium on Computational Technologies forFluid/Thermal/Structural/Chemical Systems with Industrial Applications (Vol. 491-2, pp. 59-68).
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Krzhizhanovskaya, V. V., Gorbachev, Y. E., & Sloot, P. M. A. (2004). A Grid-Based Problem-Solving Environment for Simulation of Plasma Enhanced Chemical Vapor Deposition. In Book of abstracts of the International conference "Distributed Computing and Grid Technologies in Science and Education" (pp. 89-90). JINR.
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Gorbachev, Y. E., Zatevakhin, M. A., Ignatiev, A. A., & Krzhizhanovskaya, V. V. (2004). Simulation of heat and mass transfer processes in PECVD reactors for silicon films growth under the conditions of intense formation of higher silanes in the gas phase. In The 5th Minsk International Heat and Mass Transfer Forum, MIF-2004, Book of Abstracts (Vol. 1, pp. 301-302) http://relay.itmo.by/forum/mif5/S04/4-08.pdf
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Krzhizhanovskaya, V. V., Zatevakhin, M. A., Ignatiev, A. A., Gorbachev, Y. E., & Sloot, P. M. A. (2002). Distributed Simulation of Silicon-Based Film Growth. In R. Wyrzykowski, J. Dongarra, M. Paprzycki, & J. Wasniewski (Eds.), Parallel Processing and Applied Mathematics, 4th International Conference, PPAM 2001, Naleczow, Poland (pp. 879-887). Springer. https://doi.org/10.1007/3-540-48086-2
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