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Results: 15
Number of items: 15
  • Open Access
    Zhang, Y. (2019). Organotin photoresists for extreme ultraviolet lithography. [Thesis, fully internal, Universiteit van Amsterdam].
  • Open Access
    Fallica, R., Haitjema, J., Wu, L., Castellanos Ortega, S., Brouwer, A. M., & Ekinci, Y. (2018). Absorption coefficient of metal-containing photoresists in the extreme ultraviolet. Journal of Micro/Nanolithography, MEMS and MOEMS, 17(2), Article 023505. https://doi.org/10.1117/1.JMM.17.2.023505
  • Open Access
    Zhang, Y., Haitjema, J., Liu, X., Johansson, F., Lindblad, A., Castellanos Ortega, S., Ottosson, N., & Brouwer, A. M. (2017). Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy. In C. K. Hohle (Ed.), Advances in Patterning Materials and Processes XXXIV: 27 February–2 March 2017, San Jose, California, United States Article 1014606 (Proceedings of SPIE; Vol. 10146). SPIE. https://doi.org/10.1117/12.2257893
  • Open Access
    Zhang, Y., Haitjema, J., Liu, X., Johansson, F., Lindblad, A., Castellanos, S., Ottosson, N., & Brouwer, A. M. (2017). Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy. Journal of Micro/Nanolithography, MEMS and MOEMS, 16(2), Article 023510. https://doi.org/10.1117/1.JMM.16.2.023510
  • Open Access
    Fallica, R., Haitjema, J., Wu, L., Castellanos Ortega, S., Brouwer, F., & Ekinci, Y. (2017). Absorption coefficient and exposure kinetics of photoresists at EUV. In E. M. Panning, & K. A. Goldberg (Eds.), Extreme Ultraviolet (EUV) Lithography VIII: 27 February–2 March 2017, San Jose, California, United States Article 101430A (Proceedings of SPIE; Vol. 10143). SPIE. https://doi.org/10.1117/12.2257240
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