Controlling Macroscopic Friction through Interfacial Siloxane Bonding

Open Access
Authors
Publication date 01-12-2023
Journal Physical Review Letters
Article number 226201
Volume | Issue number 131 | 22
Number of pages 7
Organisations
  • Faculty of Science (FNWI) - Van 't Hoff Institute for Molecular Sciences (HIMS)
  • Faculty of Science (FNWI) - Institute of Physics (IoP)
  • Faculty of Science (FNWI) - Institute of Physics (IoP) - Van der Waals-Zeeman Institute (WZI)
Abstract
Controlling macroscopic friction is crucial for numerous natural and industrial applications, ranging from forecasting earthquakes to miniaturizing semiconductor devices, but predicting and manipulating friction phenomena remains a challenge due to the unknown relationship between nanoscale and macroscopic friction. Here, we show experimentally that dry friction at multiasperity Si-on-Si interfaces is dominated by the formation of interfacial siloxane (Si─O─Si) bonds, the density of which can be precisely regulated by exposing plasma-cleaned silicon surfaces to dry nitrogen. Our results show how the bond density can be used to quantitatively understand and control the macroscopic friction. Our findings establish a unique connection between the molecular scale at which adhesion occurs, and the friction coefficient that is the key macroscopic parameter for industrial and natural tribology challenges.
Document type Article
Note © 2023 American Physical Society
Language English
Published at https://doi.org/10.1103/PhysRevLett.131.226201
Other links https://www.scopus.com/pages/publications/85179584543
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