Theoretical modeling of thermally activated quenching processes in Si:Er

Authors
Publication date 2006
Journal Optical Materials
Volume | Issue number 28
Pages (from-to) 825-830
Organisations
  • Faculty of Science (FNWI) - Institute of Physics (IoP) - Van der Waals-Zeeman Institute (WZI)
Document type Article
Published at https://doi.org/10.1016/j.optmat.2005.09.033
Permalink to this page
Back