Evaluation of free carrier losses to 1.54 mu m emission in Si/Si: Er nanolayers on SOI substrate for optical gain observation

Authors
Publication date 2011
Journal Optical Materials
Volume | Issue number 33 | 7
Pages (from-to) 1094-1096
Organisations
  • Faculty of Science (FNWI) - Institute of Physics (IoP) - Van der Waals-Zeeman Institute (WZI)
Abstract In this study we use a combination of variable stripe and shifting excitation spot methods to evaluate linear low temperature (4.2 K) optical properties of Si/Si:Er multinanolayer grown on SOI substrate. In particular, Er-1 luminescence at 1.54 μm under continuous wave excitation was examined. Absorption coefficients of 22.4 ± 4.2 and 45.1 ± 4.2 cm−1 at photon fluxes of 2.4 × 1019 and 2.4 × 1020 cm2 s−1, respectively, have been established. These are approximately three times higher than those found earlier for a similar structure grown on Si substrate.

Document type Article
Language English
Published at https://doi.org/10.1016/j.optmat.2010.08.025
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