Formation kinetics of the Al-related shallow thermal donors: a probe for oxygen diffusion in silicon

Authors
Publication date 1997
Journal Materials Science Forum
Volume | Issue number 258-263
Pages (from-to) 1761-1766
Organisations
  • Faculty of Science (FNWI) - Institute of Physics (IoP) - Van der Waals-Zeeman Institute (WZI)
Document type Article
Permalink to this page
Back