Annealing behavior of crystalline silicon heavily implanted with oxygen at low temperature

Authors
  • T. Tate
  • E. Ivanov
Publication date 1997
Host editors
  • C.A.J. Ammerlaan
  • B. Pajot
Book title Shallow-Level Centers in Semiconductors
Pages (from-to) 405-410
Publisher Singapore: World Scientific
Organisations
  • Faculty of Science (FNWI) - Institute of Physics (IoP) - Van der Waals-Zeeman Institute (WZI)
Document type Chapter
Language English
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