The Pressure Gap for Thiols Methanethiol Self-Assembly on Au(111) from Vacuum to 1 bar

Open Access
Authors
  • S.N. Steinmann
  • I.M.N. Groot
Publication date 16-05-2019
Journal Journal of Physical Chemistry C
Volume | Issue number 123 | 19
Pages (from-to) 12382-12389
Number of pages 8
Organisations
  • Faculty of Science (FNWI) - Institute of Physics (IoP) - Van der Waals-Zeeman Institute (WZI)
Abstract

Functionalizing noble metal surfaces with (bio)organic molecules is a vibrant field of research, with key applications in medicine, catalysis, and molecular electronics. Control over the molecular self-assembly is essential to creating functional devices. Here, we exploit our high-pressure, high-temperature scanning tunneling microscope (STM) to relate the effects of controllable parameters (temperature and pressure) to atomic-scale assembly mechanisms. Using methanethiol self-assembly on Au(111) as a model system, we monitor the formation and assembly of the ubiquitous (CH3S)2Au "staple" motif into row structures at pressures of up to 1 bar. We observe a pressure-induced transition from the usual 1/3 monolayer (ML) saturation coverage in vacuum to 3/8 ML at 1 bar, thus providing the first evidence for a pressure gap effect for thiol adsorption. Complementing our experiments, we employed dispersion-corrected density functional theory computations to model the formed surface adlayers, corresponding STM images, and underlying equilibrium thermodynamics.

Document type Article
Note With supplementary file
Language English
Published at https://doi.org/10.1021/acs.jpcc.9b03045
Other links https://www.scopus.com/pages/publications/85065888004
Downloads
acs.jpcc.9b03045 (Final published version)
Supplementary materials
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